Photoreactive Polymers : The Science and Technology of Resists /
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| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
New York :
John Wiley & Sons,
1989
|
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MARC
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|---|---|---|---|
| 001 | stu23231 | ||
| 005 | 20190206124511.5 | ||
| 008 | 950526s1989----xxu-----------------eng-d | ||
| 020 | |a 0-471-85550-0 | ||
| 040 | |a STU |b slo | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu | ||
| 080 | |a 678.01+541.14 |7 stu_us_auth*stu4542 | ||
| 100 | 1 | |a Reiser, Arnost |4 aut | |
| 245 | 1 | |a Photoreactive Polymers : |b The Science and Technology of Resists / |c [aut.]Reiser,Arnost | |
| 260 | |a New York : |b John Wiley & Sons, |c 1989 | ||
| 300 | |a 409 s : |b Obr.,tab.,grafy,lit.,index | ||
| 996 | |b C93724 |c C*93724 |l CCVIIIB |s P |a 0 |w stu23231_0001 | ||