Handbook of plasma processing technology : Fundamentals, etching, deposition and surface interactions /
Gespeichert in:
| Weitere Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | Englisch |
| Veröffentlicht: |
Park Ridge :
Noyes Publications,
1989
|
| Ausgabe: | 1.vyd. |
| Schlagworte: | |
| Tags: |
Keine Tags, Fügen Sie das erste Tag hinzu!
|
MARC
| LEADER | 00000nam a22000003a 4500 | ||
|---|---|---|---|
| 001 | stu8977 | ||
| 005 | 20150617225807.2 | ||
| 008 | 960425s1989----xxu-----------------eng-d | ||
| 020 | |a 0-8155-1220-1 | ||
| 040 | |a STU |b slo | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu | ||
| 080 | |a 533.9 | ||
| 080 | |a 538.9 |7 stu_us_auth*stu7967 | ||
| 080 | |a 621.315.592 | ||
| 080 | |a 621.382.049.77 | ||
| 084 | |a A5200 |2 INS |7 stu_us_auth*stu6175 | ||
| 084 | |a A5220 |2 INS |7 stu_us_auth*stu6176 | ||
| 084 | |a A5240 |2 INS |7 stu_us_auth*stu6177 | ||
| 084 | |a A5275 |2 INS | ||
| 084 | |a A6855 |2 INS | ||
| 084 | |a A8115H |2 INS | ||
| 084 | |a A8160C |2 INS | ||
| 084 | |a A7280 |2 INS | ||
| 084 | |a B2520 |2 INS | ||
| 084 | |a B2550E |2 INS | ||
| 100 | 1 | |a Rossnagel, Stephen M |4 com | |
| 245 | 1 | |a Handbook of plasma processing technology : |b Fundamentals, etching, deposition and surface interactions / |c Edit.: Rossnagel,Stephen M. a i | |
| 250 | |a 1.vyd. | ||
| 260 | |a Park Ridge : |b Noyes Publications, |c 1989 | ||
| 300 | |a 523 s | ||
| 650 | 7 | |a plazma |2 stusub | |
| 650 | 7 | |a fyzika polovodičov |2 stusub | |
| 650 | 7 | |a iónové leptanie |2 stusub | |
| 650 | 7 | |a fyzika povrchov |2 stusub | |
| 650 | 7 | |a Mikroelektronika |2 stusub | |
| 996 | |b E80526 |c E*80526 |l EE11 |s P |a 0 |w stu8977_0001 | ||