Process engineering analysis in semiconductor device fabrication /
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| Autori principali: | , |
|---|---|
| Natura: | Libro |
| Lingua: | inglese |
| Pubblicazione: |
New York :
McGraw-Hill,
1993
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| Edizione: | 1.vyd. |
| Soggetti: | |
| Tags: |
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MARC
| LEADER | 00000nam a22000003a 4500 | ||
|---|---|---|---|
| 001 | stu9327 | ||
| 005 | 20150617225803.2 | ||
| 008 | 961216s1993----xxu-----------------eng-d | ||
| 020 | |a 0-07-041853-5 | ||
| 040 | |a STU |b slo | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu | ||
| 080 | |a 621.315.592 | ||
| 080 | |a 621.793/.795 | ||
| 080 | |a 669.018.5 | ||
| 080 | |a 621.382 | ||
| 080 | |a 538.9 |7 stu_us_auth*stu7967 | ||
| 084 | |a A7280 |2 INS | ||
| 084 | |a A6855 |2 INS | ||
| 084 | |a A8115J |2 INS | ||
| 084 | |a A8160 |2 INS | ||
| 084 | |a B2550 |2 INS | ||
| 084 | |a B0520F |2 INS | ||
| 084 | |a A8115H |2 INS | ||
| 100 | 1 | |a Middleman, Stanley |4 aut | |
| 245 | 1 | |a Process engineering analysis in semiconductor device fabrication / |c [aut.] Middleman,Stanley; Hochberg,Arthur K | |
| 250 | |a 1.vyd. | ||
| 260 | |a New York : |b McGraw-Hill, |c 1993 | ||
| 300 | |a 774 s | ||
| 650 | 7 | |a polovodiče |2 stusub | |
| 650 | 7 | |a polovodičové materiály |2 stusub | |
| 650 | 7 | |a fyzika tuhých látok |2 stusub | |
| 650 | 7 | |a mikrolitografia |2 stusub | |
| 650 | 7 | |a iónová implantácia |2 stusub | |
| 650 | 7 | |a plazmové leptanie |2 stusub | |
| 650 | 7 | |a iónové leptanie |2 stusub | |
| 650 | 7 | |a Pokovovanie |2 stusub | |
| 700 | 1 | |a Hochberg, Arthur K |4 aut | |
| 996 | |b 284EK07570 |c E*80987 |l EE01 |s A |a 24 |w stu9327_0001 | ||