Principles of plasma discharges and materials processing /

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Main Author: Lieberman, M. A. (Michael A.)
Other Authors: Lichtenberg, Allan J.
Format: Book
Language:English
Published: Hoboken, N.J. Wiley-Interscience 2005.
Edition:2nd ed.
Subjects:
Plasma dynamics.
Thin films > Surfaces.
Plasma etching.
Plasma chemistry > Industrial applications.
Online Access:Contributor biographical information
Publisher description
Table of contents only
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082 0 0 |a 530.4/4  |2 22 
100 1 |a Lieberman, M. A.  |q (Michael A.) 
245 1 0 |a Principles of plasma discharges and materials processing /  |c Michael A. Lieberman, Allan J. Lichtenberg. 
250 |a 2nd ed. 
260 |a Hoboken, N.J.  |b Wiley-Interscience  |c 2005. 
300 |a xxxv, 757 p.  |b ill.  |c 25 cm. 
504 |a Includes bibliographical references (p. 735-748) and index. 
650 0 |a Plasma dynamics. 
650 0 |a Thin films  |x Surfaces. 
650 0 |a Plasma etching. 
650 0 |a Plasma chemistry  |x Industrial applications. 
700 1 |a Lichtenberg, Allan J. 
856 4 2 |3 Contributor biographical information  |u http://www.loc.gov/catdir/enhancements/fy0618/2004058503-b.html 
856 4 2 |3 Publisher description  |u http://www.loc.gov/catdir/enhancements/fy0618/2004058503-d.html 
856 4 1 |3 Table of contents only  |u http://www.loc.gov/catdir/enhancements/fy0618/2004058503-t.html 
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910 |a SCHK95 
919 |a 978-0-471-72001-0 
925 0 |a acquire  |b 2 shelf copies  |x policy default 
955 |d jp03 2004-10-14 to SL  |e jp05 2004-10-14 to Dewey 
955 |f pv21 2005-12-07 CIP ver. two copies to BCCD 
999 |c 2174  |d 2174 

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